GaofengLiangwas born in Shangqiu, Henan, in 1986. Hereceivedthe Ph.D. degree in plasma physicsfromUniversity of Electronic Science and Technology of China,Chengdu, China, in 2017. During 2011-2015, he was a joint PhD student in the State Key Lab of Optical Technologies on nanofabrication and microengineering, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China. During 2015-2016, he was a joint PhD student in the Department of Electrical Engineering and Computer Science, University of Michigan - Ann Arbor, Michigan, USA. Since 2017, he has been with the College of Opt-electrionic engineering, Chongqing University, where he was a Lecturer, become an Associate Professorin2020.

His research interests include subwavelength optics, plasmonics, and fabrication of micro- or nano-structured devices. The distinctive work is super resolution photolithography and sub-diffraction limitimaging,with over 30 scientific papers.